Materials Processing in Low Pressure Plasmas I: Etching, deposition, new materials

Presentations

• A new generation of cryogenic processes for silicon deep etching

  COFFEE_KLATCH · Invited

  Oct. 2, 2007, 1:30 PM – Oct. 2, 2007, 2:00 PM

  Authors

  • Remi Dussart

    • U d'Orleans
    • GREMI - University of Orleans

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• Student Excellence Award Finalist: Modeling of Deep Reactive Ion Etching of Si under plasma molding in 2f-CCP in SF$_6$/O$_2$

  ORAL

  Oct. 2, 2007, 2:00 PM – Oct. 2, 2007, 2:15 PM

  Authors

  • Fukutaro Hamaoka

    • Keio University

  • Takashi Yagisawa

    • Keio University

  • Toshiaki Makabe

    • Keio University
    • Keio Univ.

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• Student Excellence Award Finalist: Neutral production in SF$_6$/SiCl$_4$ inductively coupled plasmas

  ORAL

  Oct. 2, 2007, 2:15 PM – Oct. 2, 2007, 2:30 PM

  Authors

  • C. Duluard

    • GREMI, Orleans

  • R. Dussart

    • GREMI - Universite d'Orleans
    • GREMI, Orleans

  • L.E. Pichon

    • GREMI, Orleans

  • E.H. Oubensaid

    • GREMI, Orleans

  • P. Lefaucheux

    • U d'Orleans
    • GREMI, Orleans

  • P. Ranson

    • U d'Orleans
    • GREMI, Orleans

  • M. Puech

    • Alcatel Micro Machining Systems

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• Atomic-scale model analysis of the feature profile evolution during Si etching in chlorine- and bromine-containing plasmas

  ORAL

  Oct. 2, 2007, 2:30 PM – Oct. 2, 2007, 2:45 PM

  Authors

  • Shoki Irie

  • Yugo Osano

  • Masahito Mori

  • Koji Eriguchi

  • Kouichi Ono

    • Kyoto University

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• Effect of VUV Radiation on Fluorination of Polypropylene in Low Pressure Plasmas

  ORAL

  Oct. 2, 2007, 2:45 PM – Oct. 2, 2007, 3:00 PM

  Authors

  • Yang Yang

    • Iowa State University

  • Mark Strobel

    • 3M, Inc.

  • Seth Kirk

    • 3M, Inc.

  • Mark J. Kushner

    • Iowa State University

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• Effect of gas mixture ratio on atomic oxygen density in an inductively coupled plasma in O$_{2}$/Ar mixture

  ORAL

  Oct. 2, 2007, 3:00 PM – Oct. 2, 2007, 3:15 PM

  Authors

  • Toshikazu Sato

    • Keio Univ.

  • Toshiaki Makabe

    • Keio University
    • Keio Univ.

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• Student Excellence Award Finalist: Ion Flux and Energy Measurement at a Pulsed Biased Electrode in a C$_{2}$H$_{2}$:Argon Inductively Coupled Plasma During DLC Growth.

  ORAL

  Oct. 2, 2007, 3:15 PM – Oct. 2, 2007, 3:30 PM

  Authors

  • A. Baby

    • Nanotechnology and Integrated BioEngineering Centre, University of Ulster

  • C.M.O. Mahony

    • University of Ulster
    • Nanotechnology and Integrated BioEngineering Centre, University of Ulster

  • P.D. Maguire

    • Nanotechnology and Integrated BioEngineering Centre, University of Ulster

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