Capacitively Coupled Plasmas
FOCUS · WF1 ·
Presentations
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Negative Ions in Dual-Frequency Capacitively Coupled Fluorocarbon Plasmas
COFFEE_KLATCH · Invited
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Authors
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Jean-Paul Booth
- Ecole Polytechnique
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New insights into electron heating and ionisation mechanisms in CCP discharges at low pressures
ORAL
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Authors
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Deborah O'Connell
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Timo Gans
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Uwe Czarnetzki
- Institute for Plasma and Atomic Physics, CPST, Ruhr-University Bochum, Germany
- Institute for Plasma and Atomic Physics, Ruhr University Bochum
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David Vender
- Port Arthur, Tasmania, Australia
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Rod Boswell
- SP3/RSPhysSE, ANU, Canberra, Australia
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Electron heating mechanisms in dual frequency capacitive discharges
ORAL
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Authors
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M.M. Turner
- Dublin City University
- Dublin City University, Ireland
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P. Chabert
- Ecole Polytechnique, France
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Electron heating and ionisation mechanisms in dual-frequency capacitively coupled radio-frequency discharges
ORAL
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Authors
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Timo Gans
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Julian Schulze
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Deborah O'Connell
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Uwe Czarnetzki
- Institute for Plasma and Atomic Physics, CPST, Ruhr-University Bochum, Germany
- Institute for Plasma and Atomic Physics, Ruhr University Bochum
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Bert Ellingboe
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Miles Turner
- NCPST, Dublin City University, Ireland
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Nonlinear electron resonance heating in dual frequency capacitive discharges
ORAL
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Authors
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D. Ziegler
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T. Mussenbrock
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R.P. Brinkmann
- Institute for Theoretical Electrical Engineering, Ruhr University Bochum, D-44780 Bochum, Germany
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Global model of a Dual frequency Capacitive Discharge
ORAL
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Authors
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Pierre Levif
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Pascal Chabert
- LPTP CNRS Ecole Polytechnique
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M.M. Turner
- Dublin City University
- Dublin City University, Ireland
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Frequency dependent ion kinetics in a 300 mm dual-frequency capacitively coupled plasma reactor
ORAL
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Authors
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G.A. Hebner
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E.V. Barnat
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P.A. Miller
- Sandia National Laboratories
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A.M. Paterson
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J.P. Holland
- Applied Materials
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