Material Processing in Low Pressure Plasmas

Presentations

• The Role of Plasma Science in Materials Processing

  COFFEE_KLATCH · Invited

  Oct. 12, 2006, 1:30 PM – Oct. 12, 2006, 2:00 PM

  Authors

  • Michael Barnes

    • Intevac, Inc.

  View abstract →

• Spatial and temporal structure of a sheath formed in a 300 mm, dual-frequency capacitive argon discharge

  ORAL

  Oct. 12, 2006, 2:00 PM – Oct. 12, 2006, 2:15 PM

  Authors

  • Ed Barnat

  • Paul Miller

  • Greg Hebner

    • Sandia National Laboratories

  • Alex Paterson

  • John Holland

    • Applied Materials

  View abstract →

• Study of Nano-Contact Etching Characteristics Using C6F6 Gas.

  ORAL

  Oct. 12, 2006, 2:15 PM – Oct. 12, 2006, 2:30 PM

  Authors

  • Jong-Woo Sun

  • Sung-Chan Park

  • Chul Ho Shin

  • Chang Jin Kang

  • Han Ku Cho

  • Joo Tae Moon

    • Process Development Team, Semiconductor R\&D Center, Samsung Electronics

  View abstract →

• Etching of high-$k$ HfO$_{2}$ films in high-density chlorine-containing plasmas without rf biasing

  ORAL

  Oct. 12, 2006, 2:30 PM – Oct. 12, 2006, 2:45 PM

  Authors

  • Kouichi Ono

  • Keisuke Nakamura

  • Daisuke Hamada

  • Kazushi Osari

  • Koji Eriguchi

    • Kyoto University

  View abstract →

• Study on the characteristics of etching organic hard mask for patterning high aspect ratio contact holes

  ORAL

  Oct. 12, 2006, 2:45 PM – Oct. 12, 2006, 3:00 PM

  Authors

  • Hyun-Sil Hong

  • Sung-Il Cho

  • Mi-Na Choi

  • Chang-Jin Kang

  • Han-Ku Cho

  • Joo-Tae Moon

    • Samsung Electronics

  View abstract →

• Low-pressure Plasma Fluorination of Polypropylene

  ORAL

  Oct. 12, 2006, 3:00 PM – Oct. 12, 2006, 3:15 PM

  Authors

  • Yang Yang

    • Iowa State University

  • Mark Strobel

  • Seth Kirk

  • Hyacinth Cabibil

    • 3M Company

  • Mark J. Kushner

    • Iowa State University

  View abstract →

• A modeling of inductively coupled plasma in SF$_{6}$/O$_{2}$ for deep reactive ion etching of silicon

  ORAL

  Oct. 12, 2006, 3:15 PM – Oct. 12, 2006, 3:30 PM

  Authors

  • Toshikazu Sato

  • Toshiaki Makabe

    • Keio Univ.
    • Keio University

  View abstract →