Etching Mechanisms

Presentations

• Profile simulation of high-aspect-ratio contact etching including charging effect

  ORAL

  Oct. 20, 2005, 5:00 AM – Oct. 20, 2005, 5:15 AM

  Authors

  • Seokhyun Lim

  • Yongjin Kim

  • Yero Lee

  • Taikyung Kim

  • Gyung-Jin Min

  • Chang-Jin Kang

  • HanKu Cho

  • Joo-Tae Moon

    • Samsung Electronics Co., Ltd.

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• A self-consistent modeling of feature profile evolution under competition between etching and deposition

  ORAL

  Oct. 20, 2005, 5:15 AM – Oct. 20, 2005, 5:30 AM

  Authors

  • Takashi Shimada

  • Takashi Yagisawa

    • Keio University

  • Toshiaki Makabe

    • Keio University

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• Development of Nano-Contact Etch Process Using New Gas Chemistry.

  ORAL

  Oct. 20, 2005, 5:30 AM – Oct. 20, 2005, 5:45 AM

  Authors

  • Jong-Woo Sun

  • Chul-Ho Shin

  • Gyung-Jin Min

  • Chang-Jin Kang

  • HanKu Cho

  • Joo-Tae Moon

    • Samsung Electronics Co., Ltd.

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• Etching of high-$k$ and metal gate materials in high-density chlorine-containing plasmas

  ORAL

  Oct. 20, 2005, 5:45 AM – Oct. 20, 2005, 6:00 AM

  Authors

  • Kouichi Ono

  • Keisuke Nakamura

  • Kazushi Osari

  • Tomohiko Kitagawa

  • Kazuo Takahashi

    • Department of Aeronautics and Astronautics, Kyoto University, Japan

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• SiO$_{2}$ and Si$_{3}$N$_{4}$ Etch Mechanisms in NF$_{3}$/C$_{2}$H$_{4}$ Plasma

  ORAL

  Oct. 20, 2005, 6:00 AM – Oct. 20, 2005, 6:15 AM

  Authors

  • Puthajat Machima

  • Noah Hershkowitz

    • Department of Engineering Physics, University of Wisconsin-Madison
    • Dept. of Engineering Physics, University of Wisconsin - Madison
    • D
    • University of Wisconsin-Madison

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• Performance Tunable High-Frequency Inductively Coupled Plasma Technology in Application to Polysilicon Etcher and High Density Plasma CVD

  ORAL

  Oct. 20, 2005, 6:15 AM – Oct. 20, 2005, 6:30 AM

  Authors

  • Jong W. Shon

    • Ju Sung Engineering Ltd.

  • GiChung Kwon

    • JuSung Engineering Ltd.
    • Jusung Engineering Corporation

  • Hong Young Chang

    • KAIST
    • Korea Advanced Institute of Science and Technology

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