Capacitively Coupled Plasmas
FOCUS · RW1 ·
Presentations
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Breakdown in dual frequency capacitive discharges
ORAL
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Authors
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Miles M. Turner
- Dublin City University, Ireland
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Phase resolved optical emission spectroscopy on a dual frequency capacitively coupled rf discharge
ORAL
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Authors
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Timo Gans
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Julian Schulze
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Uwe Czarnetzki
- Institute for Plasma and Atomic Physics, Ruhr-University Bochum, Germany
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Miles M. Turner
- National Centre for Plasma Science and Technology, Dublin City University, Ireland
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Frequency dependent spatial distributions of the electrons in a 300 mm diameter VHF capacitively coupled plasmas
ORAL
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Authors
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Greg Hebner
- Sandia National Laboratories
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E. Barnat
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P. Miller
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A. Paterson
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J. Holland
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T. Lill
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$E$ to $H$ transition in very high frequency capacitive discharges.
ORAL
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Authors
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Pierre Levif
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Pascal Chabert
- Ecole Polytechnique
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Jean-Luc Raimbault
- Laboratoire de Physique et Technologie des Plasmas, Ecole Polytechnique, Palaiseau
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Jean-Marcel Rax
- LPTP, Ecole Polytechnique, France
- LPTP, Ecole Polytechnique
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M.A. Lieberman
- University of California Berkeley
- Department of Electrical Engineering and Computer Science, University of California, Berkeley, USA
- University of California, Berkeley
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PIC and fluid simulations of capacitively coupled plasmas for dielectric etchers and microplasmas
COFFEE_KLATCH · Invited
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Authors
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Jae Koo Lee
- Pohang University of Science and Technology, South Korea
- Department of Electronics and Electrical Engineering, Pohang University of Science and Technology, S.Korea
- Pohang University of Science and Technology
- Pohang University of Science and Technology, S.Korea
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Analysis of Triple-Frequency Capacitive Systems for Plasma Processing
COFFEE_KLATCH · Invited
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Authors
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Dan Hoffman
- Applied Materials, Inc.
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