Lighting and Lasers

Presentations

• High Power Extreme Ultra-Violet (EUV) Light Sources for Future Lithography

  COFFEE_KLATCH · Invited

  Oct. 19, 2005, 5:00 AM – Oct. 19, 2005, 5:30 AM

  Authors

  • Jeroen Jonkers

    • Philips EUV, Steinbachstrasse 15, 52074 Aachen, Germany

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• Excitation of O$_{2}(^{1}\Delta )$ in Pulsed Radio Frequency Flowing Plasmas for Chemical Oxygen Iodine Lasers

  ORAL

  Oct. 19, 2005, 5:30 AM – Oct. 19, 2005, 5:45 AM

  Authors

  • Natalia Babaeva

    • Iowa State University

  • Ramesh Arakoni

    • University of Illinois

  • Mark J. Kushner

    • Iowa State University

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• Plasma Kinetics of High Power Overtone Carbon Monoxide Lasers

  ORAL

  Oct. 19, 2005, 5:45 AM – Oct. 19, 2005, 6:00 AM

  Authors

  • Yurii Utkin

  • Matthew Goshe

  • Igor Adamovich

    • Ohio State University

  • Walter Lempert

    • Ohio State University

  • J.William Rich

    • Ohio State University

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• Color Rendering and Power Factor Trade-offs in Rare Earth Containing Ceramic Discharge Metal Halide Lamps

  ORAL

  Oct. 19, 2005, 6:00 AM – Oct. 19, 2005, 6:15 AM

  Authors

  • Ray Gibson

    • Philips Lighting Company

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• Model Study of Breakdown in Long Tubes

  ORAL

  Oct. 19, 2005, 6:15 AM – Oct. 19, 2005, 6:30 AM

  Authors

  • W.J.M. Brok

  • J.J.A.M. van der Mullen

  • G.M.W. Kroesen

    • Eindhoven University of Technology, The Netherlands
    • Eindhoven University of Technology

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