Material Processing

Presentations

• Diagnostics of a Supersonic Plasma Jet Reactor with Secondary Discharge

  ORAL

  Oct. 18, 2005, 1:00 PM – Oct. 18, 2005, 1:15 PM

  Authors

  • Jami McLaren

    • Department of Mechanical Engineering -- University of Minnesota

  • Lenka Zajickova

    • Department of Physical Electronics -- Masryk University, Brno, Czech Republic

  • Joachim Heberlein

    • Department of Mechanical Engineering -- University of Minnesota

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• High Frequency ICP Source for HDPCVD

  ORAL

  Oct. 18, 2005, 1:15 PM – Oct. 18, 2005, 1:30 PM

  Authors

  • Jeunghoon Han

  • Daebong Kang

  • Jinhyuk Yoo

    • JUSUNG

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• Investigation of charge-up and ion reflection effects in SiO$_2$ etching using a three-dimensional charge-up simulation

  ORAL

  Oct. 18, 2005, 1:30 PM – Oct. 18, 2005, 1:45 PM

  Authors

  • Sung Jin Kim

    • Pohang University of Science and Technology

  • Hae June Lee

    • Pusan National University

  • Jae Koo Lee

    • Pohang University of Science and Technology, South Korea
    • Department of Electronics and Electrical Engineering, Pohang University of Science and Technology, S.Korea
    • Pohang University of Science and Technology
    • Pohang University of Science and Technology, S.Korea

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• Effect of Species Density and Ion Scattering During Ashing on Ultra Low-$\kappa $ Inter-Level Dielectric Films

  ORAL

  Oct. 18, 2005, 1:45 PM – Oct. 18, 2005, 2:00 PM

  Authors

  • M.A. Worsley

  • S. Bent

  • N.C.M. Fuller

  • T.L. Tai

  • J. Doyle

  • M. Rothwell

  • T.J. Dalton

    • Stanford University

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• Etching with Electron Beam-Generated Ion-Ion Plasmas

  ORAL

  Oct. 18, 2005, 2:00 PM – Oct. 18, 2005, 2:15 PM

  Authors

  • S.G. Walton

    • Naval Research Laboratory

  • D. Leonhardt

    • Plasma Physics Div., Naval Research Lab

  • M. Lampe

  • R.F. Fernsler

    • US Naval Research Laboratory

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