Magnetically-enhanced Plasmas

Presentations

• Experimental and Theoretical Investigation of Dual Frequency Magnetically Enhanced Reactive Ion Etch Plasmas

  ORAL

  Oct. 17, 2005, 5:00 AM – Oct. 17, 2005, 5:15 AM

  Authors

  • Alex Paterson

  • Theodoros Panagopoulos

  • Valentin Todorow

  • Sharma Pamarthy

    • Applied Materials

  • Declan Scanlan

  • Thorsten Lill

  • John Holland

    • Applied Materials

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• A self-consistent modeling of an RF magnetron plasma with metallic and dielectric target for sputtering

  ORAL

  Oct. 17, 2005, 5:15 AM – Oct. 17, 2005, 5:30 AM

  Authors

  • Takashi Yagisawa

    • Keio University

  • Shunji Kuroiwa

    • Shibaura Mechatronics Corp.

  • Toshiaki Makabe

    • Keio University

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• LIF Measurement of Time-Dependent Spatial Density Distribution of Cu Atoms Ejected from a YBaCuO Target in Magnetron~Sputtering Plasmas

  ORAL

  Oct. 17, 2005, 5:30 AM – Oct. 17, 2005, 5:45 AM

  Authors

  • Junsi Gao

  • Nayan Nafarizal

  • Koichi Sasaki

  • Hirotaka Toyoda

  • Masumi Inoue

  • Akira Fujimaki

  • Satoshi Iwata

  • Hideo Sugai

    • Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

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• Time-Resolved Imaging of a Pulsed DC Magnetron Plasma During the Sputter Deposition of TiO$_{2}$ Films

  ORAL

  Oct. 17, 2005, 5:45 AM – Oct. 17, 2005, 6:00 AM

  Authors

  • Abe Belkind

    • Stevens Institute of Technology
    • Stevens Institute of Technology, Hoboken, NJ, USA

  • Kurt Becker

  • Jose Lopez

    • Stevens Institute of Technology

  • Shanmugamurthy Shanmugamurthy

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• Magnetically Enhanced Multiple Frequency Capacitively Coupled Plasmas: Dynamics and Strategies

  COFFEE_KLATCH · Invited

  Oct. 17, 2005, 6:00 AM – Oct. 17, 2005, 6:30 AM

  Authors

  • Mark J. Kushner

    • Iowa State University

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