Diffraction gratings for atom cooling produced by direct laser writing

ORAL

Abstract

We report the use of a direct laser-writing process to fabricate a 2D diffraction grating that can form a magneto-optical trap from a single laser beam. This approach significantly speeds up the fabrication process of these gratings compared to the conventionally used electron-beam lithography approach [1]. We also discuss the effects of imperfect suppression of higher-order diffractions — arising from the resolution limits of the direct laser writer — on the trapping and cooling region of the MOT.

[1] A surface-patterned chip as a strong source of

ultracold atoms for quantum technologies, C. C. Nshii1, M. Vangeleyn1, J. P. Cotter2, P. F. Griffin, E. A. Hinds, C. N. Ironside, P. See, A. G. Sinclair, E. Riis and A. S. Arnold

*This research was undertaken in part due to funding from the Canada First Research Excellence Fund and TQT. This work was also supported by Industry Canada, an NSERC Discovery grant, and Ontario’s Ministry of Innovation Early Researcher Award.

Publication: Massive production of diffraction gratings for atom cooling ----ongoing

Presenters

  • Yujia Yuan

    • University of Waterloo

Authors

  • Yujia Yuan

    • University of Waterloo
  • Paul Anderson

    • University of Waterloo
  • Sreesh Venuturumilli

    • University of Waterloo
    • Institute for Quantum Computing
  • Rubayet Al Maruf

    • University of Waterloo
    • Institute for Quantum Computing
  • Behrooz Semnani

    • University of Waterloo
    • Institute for Quantum Computing
  • Michal Bajcsy

    • University of Waterloo
    • Institute for Quantum Computing