Deposition of Metals via Chemical Vapor Deposition

In an effort to develop a CVD process to deposit metals on various substrates I have created a multi-gas system with a computer controlled interface. This allows the use of up to 5 different gasses as reactants or carriers for the CVD process. I have also fabricated a specialized heated [gas flow chamber wherein solid materials can be volatilized with heat and carried to the substrate by gas also heated in the chamber. I will present the design of this chamber and it's function in our current deposition process along with preliminary results of the deposition of tungsten on various substrates.