Controlled Placement of Carbon Nanotubes using Massively Parallel Indirect Dielectrophoresis

Dielectrophoresis has been used to place nanotubes, nanorods, nanowires, and other nanostructures between surface patterned metal electrodes. This technique can deposit a varying number of structures between each set of electrodes. We have developed a method to control the number of deposited singled-walled carbon nanotubes by tuning the impedance of capacitively-coupled electrodes through parameters such as electrode geometry and AC driving frequency. Controlled placement of nanotubes at high yield is a prerequisite for the use of carbon nanotube devices in modern integrated circuitry.